1

Composition of thin films formed by ion sputtering of alloys

Year:
1981
Language:
english
File:
PDF, 38 KB
english, 1981
2

Influence of ion bombardment on the properties of vacuum-evaporated thin films

Year:
1976
Language:
english
File:
PDF, 265 KB
english, 1976
3

Structure and properties of deposits grown by ion-beam-activated vacuum deposition techniques

Year:
1979
Language:
english
File:
PDF, 559 KB
english, 1979
7

Simulation of dry etching through a mask

Year:
1994
Language:
english
File:
PDF, 700 KB
english, 1994
11

International news

Year:
2003
Language:
english
File:
PDF, 24 KB
english, 2003
16

Surface roughening resulting from ion irradiation of multilayered materials

Year:
1995
Language:
english
File:
PDF, 891 KB
english, 1995
17

Elementary processes in thin film formation stimulated by high energy ion irradiation

Year:
1994
Language:
english
File:
PDF, 501 KB
english, 1994
19

Acoustic emission induced by ion implantation

Year:
1983
Language:
english
File:
PDF, 525 KB
english, 1983
36

Plasma erosion of tungsten films with different carbon content

Year:
2008
Language:
english
File:
PDF, 404 KB
english, 2008
38

Plasma hydrogenation of MgAl thin films and H2 effusion

Year:
2005
Language:
english
File:
PDF, 261 KB
english, 2005
44

The altered layer formation during the reactive ion etching of GaAs in CF2Cl2+O2 plasma

Year:
1998
Language:
english
File:
PDF, 309 KB
english, 1998
45

Sputtering induced roughening effects on ion beam profiling of multilayers

Year:
1996
Language:
english
File:
PDF, 624 KB
english, 1996